OPTICD DLC CLARUS has several unique features,

Firstly, with Ø585mm diameter, the capacity is amongst the largest in the field and can hold substrates with almost any shape or geometry, up to a diameter of 550mm with a height of 70 to 80mm for single substrates, or produce vast throughput of smaller parts with a batch time of ~1h.

Secondly, The deposition temperature is cold (<60°C), this limits exposure to hot substrates but it also reduces stress and flaking of the coating when coating, seed layer and substrate have a thermal expansion mismatch.

Thirdly, OPTICS DLC CLARUS has a self clean feature so each batch produces consistently uniform films that are up to several microns thick on a variety of substrates with little to no run-to-run variation. 

Fourthly, and because the tool is 100% symmetrical in its design and build, it offers excellent uniformity! Where competing DLC tools have the pump port and the plasma charge port offset, OPTICS DLC CLARUS has both centered.

Fifthly, and the most important to achieve high yield is the excellent layer control. Twenty years of DLC deposition experience onto high value semiconductor pedestals has taught (and forced) us to design our own layer control software and PID's. This guarantees each step of the process transition is executed in a smooth, controlled and effective way so each product run is copy-exact.

Lastly, with a footprint of 1500mm [59"] x 1200mm [48"] it takes up little space. There is no 19" rack that needs to be installed, no cables running over the floor.  All components are integrated within a single chassis keeping the floor and work environment clean of dust which contributes to yield improvements. Dust = nodules. The entire tool rolls on castors so without our help, it can be moved around if you need to do so.

Examples of substrate materials include:

Si, Ge, II-VI compounds, optical glasses, chalcogenides, sapphire, metals, and plastics.