Latest, most advanced system for semiconductor applications
Significantly faster, smaller, lower cost
Patented and patent-pending, CRONUS is our latest and most advanced semiconductor substrate coater, utilizing both ESC MCA PVD and high-current ION chucks. It delivers class-leading purity: 99.99%.
Compared with existing technology, CRONUS delivers a five times greater deposition rate and a four times greater throughput. CapEx is reduced by 25%, and cost per batch is reduced by 35%. In addition, the system has a 30% smaller footprint!
CRONUS enables tetrahydral DLC (ta-CH) with a range of dopants (metals, freons, oxygen, nitrogen). And its coatings are super hydrophobic and oleophobic.