Proprietary IP developed from over two decades of thin film specialization
These are a few of the special system design advances that we can provide exclusively…
We can create low-pressure DLC deposition with high electron-assist source, which creates purer films. This permits more conformal coating of cavities and also allows more directional film flux.
We can employ RF low-pulsing frequency to relay and unstress deposited films, which produces superior stress-free films. And because of less stress at the boundaries between substrate, sublayers, and final layers, this can enable DLC deposition on substrates not usually suited to DLC. This also enables thicker DLC films. And it reduces deposition temperatures, enabling coating on plastics and other temperature-sensitive materials.
Our special blended DLCs can withstand higher temperatures – up to 800ºC or 1500ºF – for longer durations, both in wet and dry conditions.
Our special tetrahedral amorphous hydrogenated DLC (ta-C:H) can have greater hardness. Also, electrical properties that can be tailored to the application (conductive or dielectric). Also, a rapid deposition rate of 2.5nm/sec or 9µm/h.
Our latest coating equipment can deposit monolayers that have alternating properties for maximum application flexibility.
Our DLC coating is pinhole-free, giving many application advantages.
Our doped DLC is superhydrophobic. It also provides superior lubrication properties and reduced friction, especially in wet and oily environments.
And that’s just the start. Our proprietary IP and techniques can deliver a wide range of advantages in different applications. Just let us know about your special needs…
